Metal Targets
High-purity elemental targets for conductive, optical, barrier and functional films.
- Ag, Al, Au, Cr, Cu, Hf, Mo, Nb, Ni, Ta, Ti, W, Zn
- Multiple purity levels
- Standard or custom dimensions
Request a Quote Thin-film deposition materials
Sputtering Targets
Custom and standard planar targets for research, pilot production and industrial thin-film deposition.
Material range
Built around the specification.
Final feasibility, purity, density, tolerances and bonding method depend on the selected material, target size and cathode configuration.
Alloy Targets
Homogeneous alloy targets produced to customer-defined or established compositions.
- CIGS and multi-element alloys
- Magnetic and functional alloys
- Composition review before order
Ceramic Targets
Oxide, nitride and compound targets for functional and dielectric coatings.
- ZnO, TiO₂ and related oxides
- Bi₂Se₃ and chalcogenides
- Densification route by material
Bonding & Backing Plates
Target assemblies prepared around your cathode geometry and operating conditions.
- Copper backing plates
- Indium or elastomer bonding where suitable
- Dimensional drawing review
Representative products
Materials we regularly evaluate.
Availability, manufacturability and final specification are confirmed individually for each inquiry.
MaterialFormula / TypeTypical supplyOptions
CIGS TargetCu(In,Ga)Se₂Planar sputtering targetCustom composition · backing plate
Indium Tin OxideITOTransparent conductive targetMultiple In₂O₃:SnO₂ ratios
Aluminium Zinc OxideAZOTransparent conductive targetCustom doping and size
Aluminium Scandium NitrideAlScNPiezoelectric targetCustom Sc content
Zinc OxideZnOCeramic targetUndoped or doped · custom size
Titanium DioxideTiO₂Ceramic targetPurity and density by inquiry
Hafnium DioxideHfO₂High-k ceramic targetPurity and density by inquiry
Aluminium NitrideAlNNitride targetBonded or unbonded
Cobalt Iron BoronCoFeBMagnetic alloy targetComposition by specification
Yttria-Stabilized ZirconiaYSZCeramic targetY₂O₃ content by specification
Lithium Cobalt OxideLiCoO₂Battery thin-film targetComposition and density review
Bismuth SelenideBi₂Se₃Compound targetTarget or source material
TantalumTaRefractory metal targetHigh purity · custom geometry
TungstenWRefractory metal targetHigh purity · custom geometry
CopperCuMetal targetHigh purity · bonded or unbonded
SilverAgMetal targetHigh purity · custom dimensions
AluminiumAlMetal targetPlanar · bonded or unbonded
TitaniumTiMetal targetMultiple grades and purities
HafniumHfMetal targetCustom diameter and thickness
MolybdenumMoMetal targetStandard or custom geometry
Custom AlloyCustomer-definedAlloy targetFeasibility and composition review
Application areas
Where these materials perform.
01Semiconductor devices02Photovoltaic absorbers03Optical coatings04Sensors & MEMS05Magnetic thin films06University research
Frequently asked questions
Before you request a quote.
Every order is reviewed against the complete technical specification.
Which details are needed to quote a sputtering target?
Please provide the material or composition, purity, target diameter or length and width, thickness, quantity, cathode model and whether a backing plate or bonding is required.
Can Adesis supply custom-composition sputtering targets?
Yes. Custom alloys, doped ceramics and multi-element compositions are evaluated for manufacturability, density, dimensions and required quantity before quotation.
Are bonded and unbonded targets available?
Both may be available. The suitable backing plate and bonding method depend on the target material, geometry, cathode configuration and operating conditions.
What purity levels are available?
Purity depends on the material and production route. State the minimum purity and any critical impurity limits so they can be confirmed with the quotation.
Technical inquiry
Specify your sputtering targets requirement.
Send the material, purity, dimensions, quantity and application. We will review the complete specification before quoting.