Ceramic target materials

Oxide, Nitride & Carbide Sputtering Targets

Dense ceramic sputtering targets for dielectric, optical, piezoelectric and protective thin films.

Category overview

A defined product group.
An open specification range.

Ceramic target feasibility depends on chemistry, dopant ratio, density, brittleness and target dimensions. Bonding is often considered together with thermal and mechanical behavior.

Representative materials

Frequently requested products.

Availability, final purity, dimensions and documentation are confirmed with each quotation.

01ITO

Indium Tin Oxide

Conductive oxide target

Multiple In₂O₃:SnO₂ ratios
02AZO

Aluminium Zinc Oxide

Doped oxide target

Custom Al content
03HfO₂

Hafnium Dioxide

High-k ceramic target

Purity and density by inquiry
04AlScN

Aluminium Scandium Nitride

Piezoelectric target

Custom Sc content
05AlN

Aluminium Nitride

Nitride target

Bonded or unbonded
06SiC

Silicon Carbide

Carbide target

Stoichiometry and density review

Supply forms

Available configurations

  • Dense planar targets
  • Doped ceramic compositions
  • Bonded assemblies
  • Custom diameters
  • Segmented designs where applicable

Applications

Typical use areas

  • Transparent conductors
  • High-k dielectrics
  • MEMS and piezoelectrics
  • Optical coatings
  • Protective coatings
  • Sensors

For a precise RFQ

Information to include

  1. Compound and dopant ratio
  2. Purity and density
  3. Dimensions and tolerance
  4. Bonding requirement
  5. Cathode and power conditions
  6. Quantity

Technical inquiry

Send your oxide, nitride & carbide sputtering targets requirement.

Send the material, purity, dimensions, quantity and application. We will review the complete specification before quoting.

Start your RFQ