Supply forms
Available configurations
- Custom scandium content
- Planar ceramic target
- Bonded target assembly
- Research and pilot sizes
Request a Quote Sputtering Targets
AlScN Sputtering Target
Al₁₋ₓScₓNCustom-composition aluminium scandium nitride targets for piezoelectric, RF and MEMS thin-film research.
RFQ specification
Information to provide
- Requested Sc atomic percentage
- Purity
- Target dimensions
- Density requirement
- Backing and bonding
- Cathode and process information
Applications
Typical use areas
- Piezoelectric MEMS
- RF filters
- Acoustic resonators
- Sensors
- Ferroelectric research
Technical definition
Parameters used to define this product.
These are specification fields, not fixed stock values. The offered values are confirmed against your RFQ.
Nominal chemistryAl₁₋ₓScₓN; scandium fraction x defined by the customer
Product classMulticomponent nitride sputtering target
Critical controlsSc atomic %, oxygen/metallic impurities, density and geometry
Process relevanceComposition is selected around piezoelectric, RF or MEMS film development
Order definition
What is confirmed with your quotation.
Material specification
Purity, composition, grade, dimensions, tolerances and requested form.
Production configuration
Bonding, backing, surface finish, packaging or other product-specific options.
Documentation
Analysis documentation and any additional agreed dimensional or assembly records.
Commercial supply
Quantity, lead time, DAP or EXW delivery and the applicable quotation validity.
Values and forms shown are representative. Adesis confirms the commercially offered specification in the quotation and order documents.
Technical inquiry
Specify your alscn sputtering target requirement.
Send the material, purity, dimensions, quantity and application. We will review the complete specification before quoting.